Lacking access to EUV, DUV with multipatterning has been important to SMIC’s production of 7 nm node chips, including AI chips for Huawei. Regarding DUV machines, government sources informed CSIS that the efficiency thresholds would limit machines at or above the performance of the Twinscan NXT 2000i, meaning that not all argon fluoride immersion DUV instruments might be restricted. Government officials informed CSIS that this will probably be most impactful when applied by U.S. In the case of HBM, Reuters reported that future U.S.